Photomask Japan 2015, Photomask and Next-Generation Lithography Mask Technology XXII
Proc. of SPIE Vol. 9658, 965805 · © 2015 SPIE CCC code: 0277-786X/15/$18 · doi: 10.1117/12.2196388
Daniel Chalom 1, Jan Klikovits 1, David Geist 1, Peter Hudek 1, Stefan Eder-Kapl 1,
Mehdi Daneshpanah 3, Frank Laske 2, Stefan Eyring 2, Klaus-Dieter Roeth 2
1 IMS Nanofabrication AG, Vienna and Brunn am Gebirge, Austria
2 KLA-Tencor GmbH, Weilburg, Germany
3 KLA-Tencor Inc., Milpitas, California, USA
