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14. Juli 2022 in Publikationen

2022 | JM3 Journal of Micro/Nanopatterning, Materials, and Metrology; VOL 20/No. 4

 "Multi-beam mask writer exposure optimization for EUV mask stacks" Peter Hudek, Michal Jurkovic, Pavlina Choleva, Witold Wroczewski - IMS Nanofabrication GmbH Masahiro Hashimoto, Kazunori Ono, Toru Fukuim - HOYA Toshiya…
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4. Januar 2019 in Publikationen

2016 | Invited Paper: MBMW-101: World’s 1st High-Throughput Multi-Beam Mask Writer

Photomask Technology 2016 Vol. 9985, 998505 · © 2016 SPIE · CCC code: 0277-786X/16/$18 · doi: 10.1117/12.2243638 Christof Klein and Elmar Platzgummer
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3. Januar 2019 in Publikationen

2015 | Investigation of local registration performance of IMS Nanofabrication’s Multi-Beam Mask Writer

Photomask Japan 2015, Photomask and Next-Generation Lithography Mask Technology XXII Proc. of SPIE Vol. 9658, 965805 · © 2015 SPIE CCC code: 0277-786X/15/$18 · doi: 10.1117/12.2196388 Daniel Chalom 1, Jan…
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2. Januar 2019 in Publikationen

2013 | Invited Paper: Performance of the Proof-of-Concept Multi-Beam Mask Writer (MBMW POC)

SPIE Photomask Technology BACUS 2013 Vol-8880 · © 2013 SPIE · CCC code: 0277-786X/16/$18 · doi: 10.1117/12.2243638 Christof Klein, Hans Loeschner, and Elmar Platzgummer
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