The fully-developed Multi-Beam Mask Writer (MBMW) offers both precision and exceptionally-high productivity for mask technology nodes from 28 to 5 nanometers (nm).
As of 2016, IMS has been serving the mask industry with MBMW-101 mask writer production tools for use with the 7-nanometer technology node. The first MBMW-201 2nd generation MBMW-201 tools for the 5-nanometer technology node will be delivered in 2019.
The world’s first multi-beam mask writer for 6-inch photomasks, the MBMW Alpha tool, was realized in February 2014. In 2016, the MBMW’s data rate was increased by a factor of ten, to 120 Gbit/s.