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2013 | Electron multibeam technology for mask and wafer writing at 0.1 nm address grid

By 1. January 2019March 26th, 2019No Comments

Journal of Micro/Nanolithography, MEMS, and MOEMS (JM3), 031108, Jul-Sep 2013, Vol. 12(3)

Elmar Platzgummer, Christof Klein, and Hans Loeschner

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