2013 | Electron multibeam technology for mask and wafer writing at 0.1 nm address grid Publikationen 2013 | Electron multibeam technology for mask and wafer writing at 0.1 nm address grid
IMS presents at Photomask Japan | PMJ´18, 18.-20. April 2018, Yokohama/JP News IMS presents at Photomask Japan | PMJ´18, 18.-20. April 2018, Yokohama/JP
IMS presents at SPIE Advanced Lithography | 25. Feb. – 1. Mar. 2018, San Jose/CA News IMS presents at SPIE Advanced Lithography | 25. Feb. – 1. Mar. 2018, San Jose/CA
Verleihung des BACUS Prize 2017 in Monterey, Kalifornien, USA News Verleihung des BACUS Prize 2017 in Monterey, Kalifornien, USA
IMS presents at SPIE Photomask Technology | BACUS´17, 11-14 Sept. 2017, Monterey/CA News IMS presents at SPIE Photomask Technology | BACUS´17, 11-14 Sept. 2017, Monterey/CA
IMS and JEOL partner to provide world’s 1st production Multi-Beam Mask Writer News IMS and JEOL partner to provide world’s 1st production Multi-Beam Mask Writer
Executive Interview of Elmar Platzgummer by Mark LaPedus at BACUS´16 News Executive Interview of Elmar Platzgummer by Mark LaPedus at BACUS´16
Invited presentation of Elmar Platzgummer / CEO at SEMICON Taiwan News Invited presentation of Elmar Platzgummer / CEO at SEMICON Taiwan
