„Multi-beam mask writer exposure optimization for EUV mask stacks“
Peter Hudek, Michal Jurkovic, Pavlina Choleva, Witold Wroczewski – IMS Nanofabrication GmbH
Masahiro Hashimoto, Kazunori Ono, Toru Fukuim – HOYA
Toshiya Takahashi and Kotaro Takahashi – FUJIFILM Corporation